The spinel oxide ZnxNi1-xMn2O4 (ZNMO, x=0, 0.05, 0.1, 0.15, 0.2, 0.25) films have been grown on Pt/Ti/SiO2/Si substrate by chemical solution deposition (CSD) method. The crystallization and microstructural features of ZNMO films are studied by x-ray diffraction (XRD) and field-emission scanning electron microscopy (FESEM) analysis, respectively. The results show that the structural property of ZNMO films is affected by Zn concentration. The optical constants of ZNMO films have been analyzed by spectroscopic ellipsometry measurements in the wavelength range of 300-1 100 nm. The changes of the refractive index n and extinction coefficient k caused by Zn substituting are discussed. The A1g and F2g modes have been observed in Raman spectra. The relative intensity of the A1g mode decreases with increasing Zn concentration. The Raman peak positions shift slightly with Zn concentration x, which might result from lattice strain and lattice mismatch.