Study on Multi-wavelength Thin Film Thickness Determination Method
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1.School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China;2.State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China;3.Shanghai Engineering Research Center of Energy-Saving Coatings, Shanghai 200083, China;4.Shanghai Key Laboratory of Optical Coatings and Spectral Modulation, Shanghai 20083, China;5.Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China

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Supported by National Key R&D Program of China (2021YFA0715500), National Natural Science Foundation of China (NSFC) (12227901), Strategic Priority Research Program (B) of the Chinese Academy of Sciences (XDB0580000), Shanghai Municipal Science and Technology Major Project(2019SHZDZX01) and Chinese Academy of Sciences President"s International Fellowship Initiative (2021PT0007).

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    Abstract:

    This work introduces a novel method for measuring thin film thickness, employing a multi-wavelength method that significantly reduces the need for broad-spectrum data. Unlike traditional techniques that require several hundred spectral data points, the multi-wavelength method achieves precise thickness measurements with data from only 10 wavelengths. This innovation not only simplifies the process of spectral measurement analysis but also enables accurate real-time thickness measurement on industrial coating production lines. The method effectively reconstructs and fits the visible spectrum (400-800 nm) using a minimal amount of data, while maintaining measurement error within 7.1%. This advancement lays the foundation for more practical and efficient thin film thickness determination techniques in various industrial applications.

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History
  • Received:February 26,2024
  • Revised:July 16,2024
  • Adopted:April 17,2024
  • Online: July 15,2024
  • Published:
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