1.National Key Laboratory of Materials for Integrated Circuits, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;2.Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
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Supported by the National Natural Science Foundation of China (61927813, 62035014, 62275258), and Science and Technology Commission of Shanghai Municipal (21ZR1474600).
LI Hong-Yi, TAN Zhi-Yong, WAN Wen-Jian, CAO Jun-Cheng. Non-destructive thickness measurement with micron level accuracy based on a 4.3-THz quantum-cascade laser[J]. Journal of Infrared and Millimeter Waves,2024,43(3):356~360
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