Non-destructive thickness measurement with micron level accuracy based on a 4.3-THz quantum-cascade laser
Author:
Affiliation:

1.National Key Laboratory of Materials for Integrated Circuits, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;2.Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

Clc Number:

TN219

Fund Project:

Supported by the National Natural Science Foundation of China (61927813, 62035014, 62275258), and Science and Technology Commission of Shanghai Municipal (21ZR1474600).

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    Abstract:

    A homodyne detection system to acquire the thickness of silicon wafers is constructed and described. By harnessing the relationship between the transmission phase change of a 4.3-THz light beam and the incident angle controlled by a mechanical rotating stage, the thickness value of sample can be precisely deduced using the standard residual error method. The results indicate that the fitted thickness of the sample differs by only 2.5~3 μm from more accurate results measured by optical microscopes, achieving terahertz non-destructive thickness measurement with micron level accuracy. The experiment validates the effectiveness of terahertz quantum-cascade laser in non-contact and nondestructive measurement.

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LI Hong-Yi, TAN Zhi-Yong, WAN Wen-Jian, CAO Jun-Cheng. Non-destructive thickness measurement with micron level accuracy based on a 4.3-THz quantum-cascade laser[J]. Journal of Infrared and Millimeter Waves,2024,43(3):356~360

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History
  • Received:August 28,2023
  • Revised:April 20,2024
  • Adopted:September 13,2023
  • Online: April 12,2024
  • Published: