Effect of Be doping in active regions on the performance of 1.3 μm InAs quantum dot lasers
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Affiliation:

1.School of Physics and Physical Engineering, Shandong Provincial Key Laboratory of Laser Polarization and Information Technology, Qufu Normal University, Qufu 273165, China;2.Key Laboratory of Terahertz Solid State Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;3.Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

Clc Number:

O43

Fund Project:

Supported by National Natural Science Foundation of China(61674096)

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    Abstract:

    InAs DWELL quantum dot lasers were grown on GaAs(100) substrate by molecular beam epitaxy technology. The effect of Be doping in active regions on the performance of InAs quantum dot lasers has been studied. The results show that Be-doped in the active region could effectively reduce the threshold current density, improve the output power, and increase the temperature stability of the InAs quantum dot laser.The threshold current of Be-doped InAs quantum dot laser was reduced to 12 mA, and the corresponding threshold current density was 100 A/cm2. The highest output power of the laser was 183 mW, and the highest operating temperature reached 130 ℃. This is of great significance for the application of InAs quantum dot laser device in the optical communication system.

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DU An-Tian, CAO Chun-Fang, HAN Shi-Xian, WANG Hai-Long, GONG Qian. Effect of Be doping in active regions on the performance of 1.3 μm InAs quantum dot lasers[J]. Journal of Infrared and Millimeter Waves,2023,42(4):450~456

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History
  • Received:December 22,2022
  • Revised:June 09,2023
  • Adopted:February 09,2023
  • Online: June 09,2023
  • Published: