Millimeter wave Schottky diode characterization and on-wafer measurement
Author:
Affiliation:

1.School of Transportation and Civil Engineering, Nantong University, Nantong 226019, China;2.Key Laboratory of Polar Materials and Devices, Ministry of Education, East China Normal University, Shanghai 200241, China;3.School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China

Clc Number:

O43

Fund Project:

Supported by the National Natural Science Foundation of China (62034003).

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    Abstract:

    In this paper, the one-port and two-port measurement methods for millimeter wave Schottky diodes are developed, and the corresponding test structures are designed. The variation of cut-off frequency with parasitic resistance and zero bias intrinsic capacitance are analyzed. The equivalent circuit models of small signal and large signal are given. A commercial Schottky diode has been used to extract the small signal model parameters. The experimental results show that the S-parameters agree well under on and off bias condition.

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ZHANG Ao, GAO Jian-Jun. Millimeter wave Schottky diode characterization and on-wafer measurement[J]. Journal of Infrared and Millimeter Waves,2022,41(5):856~862

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History
  • Received:January 11,2022
  • Revised:September 06,2022
  • Adopted:March 08,2022
  • Online: September 05,2022
  • Published: