ZHOU Chang-He
University of Chinese Academy of Sciences, Beijing 100049, China;Key Laboratory of Infrared Imaging Materials and Devices, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, ChinaYANG Jian-Rong
Key Laboratory of Infrared Imaging Materials and Devices, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, ChinaZHOU Mei-Hua
Key Laboratory of Infrared Imaging Materials and Devices, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, ChinaXU Chao
Key Laboratory of Infrared Imaging Materials and Devices, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China1.University of Chinese Academy of Sciences, Beijing 100049, China;2.Key Laboratory of Infrared Imaging Materials and Devices, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China
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Supported by the Innovation Program of SITP (CX-299)
ZHOU Chang-He, YANG Jian-Rong, ZHOU Mei-Hua, XU Chao. Correlation between Everson etch pits and material defects of (112) B CdZnTe substrates[J]. Journal of Infrared and Millimeter Waves,2021,40(4):432~438
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