1.University of Chinese Academy of Sciences, Beijing 100049, China;2.Key Laboratory of Infrared Imaging Materials and Devices, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China
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Supported by the Innovation Program of SITP (CX-299)
ZHOU Chang-He, YANG Jian-Rong, ZHOU Mei-Hua, XU Chao. Correlation between Everson etch pits and material defects of (112) B CdZnTe substrates[J]. Journal of Infrared and Millimeter Waves,2021,40(4):432~438
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