A 3.0 THz detector in 65 nm standard CMOS process
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1.State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;2.Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;3.Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

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TN386.1

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    Abstract:

    A 3.0 THz detector based on plasma-wave theory proposed by Dyakonov and Shur was designed and fabricated in 65 nm standard CMOS process, the detector consists of a patch antenna, a NMOS field effect transistor, a matching network, and a notch filter, it can achieve a room-temperature responsivity (Rv) of 526 V/W and a noise equivalent power (NEP) of 73 pW/Hz1/2. The terahertz scanning imaging system was built with the detector and stepper motor, and the far-field shape of the terahertz source beam was obtained, the full width at half maximum (FWHM) of the beam is 240 μm; and the image of the polyformaldehyde toothpick and tree leaf were obtained through the scanning imaging system, it shows that CMOS terahertz detectors have potential applications in the imaging field.

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FANG Tong, LIU Li-Yuan, LIU Zhao-Yang, FENG Peng, LI Yuan-Yuan, LIU Jun-Qi, LIU Jian, WU Nan-Jian. A 3.0 THz detector in 65 nm standard CMOS process[J]. Journal of Infrared and Millimeter Waves,2020,39(1):56~64

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History
  • Received:May 08,2019
  • Revised:December 17,2019
  • Adopted:August 22,2019
  • Online: January 07,2020
  • Published:
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