(英)沉积温度对脉冲激光沉积法在YSZ (100)衬底上生长的Mn1.56Co0.96Ni0.48O4尖晶石薄膜结构、电学和磁学性能的影响
投稿时间:2020-02-05  修订日期:2020-11-13  点此下载全文
引用本文:张韬略,刘芳,林铁,徐德才,侯云.(英)沉积温度对脉冲激光沉积法在YSZ (100)衬底上生长的Mn1.56Co0.96Ni0.48O4尖晶石薄膜结构、电学和磁学性能的影响[J].红外与毫米波学报,2020,39(6):678~683].ZHANG Tao-Lue,LIU Fang,LIN Tie,XU De-Cai,HOU Yun.Effects of deposition temperature on the structural, electrical and magnetic properties of Mn1.56Co0.96Ni0.48O4 spinel films grown on YSZ (100) substrates by pulsed laser deposition[J].J.Infrared Millim.Waves,2020,39(6):678~683.]
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作者单位E-mail
张韬略 上海理工大学 材料科学与工程学院上海 200093
中国科学院上海技术物理研究所 红外物理国家重点实验室上海 200083 
ztl1754355048@163.com 
刘芳 上海理工大学 材料科学与工程学院上海 200093  
林铁 中国科学院上海技术物理研究所 红外物理国家重点实验室上海 200083  
徐德才 上海理工大学 材料科学与工程学院上海 200093
中国科学院上海技术物理研究所 红外物理国家重点实验室上海 200083 
 
侯云 中国科学院上海技术物理研究所 红外物理国家重点实验室上海 200083 hyun@mail.sitp.ac.cn 
中文摘要:在YSZ(100)衬底上,采用脉冲激光沉积法在500℃至700℃的不同沉积温度下生长出尖晶石结构的Mn1.56Co0.96Ni0.48O4(MCNO)薄膜.由于沉积温度是制备高质量薄膜的重要因素,本文研究了MCNO薄膜结构、电学和磁学性能随沉积温度的变化.通过对X射线衍射图和原子力显微镜图像的分析,发现MCNO薄膜的结晶与沉积温度有很大关系.随着沉积温度的升高,MCNO薄膜的电阻率呈V型变化,其导电过程可以用小极化子跳跃机理来描述.同时,随温度变化的磁化曲线表明所有样品都显示出从铁磁性到顺磁性的转变,且沉积温度为600℃的MCNO薄膜具有216 K的高居里温度.以上研究结果表明,在600℃沉积的MCNO薄膜具有适用于热敏电阻器件和多功能异质结所需的良好性能.
中文关键词:薄膜技术  脉冲激光沉积  沉积温度  磁学性能
 
Effects of deposition temperature on the structural, electrical and magnetic properties of Mn1.56Co0.96Ni0.48O4 spinel films grown on YSZ (100) substrates by pulsed laser deposition
Abstract:Mn1.56Co0.96Ni0.48O4 (MCNO) thin films with spinel structure were grown on YSZ (100) substrates at different deposition temperatures from 500℃ to 700℃ by pulsed laser deposition. Since the deposition temperature is an important factor in fabricating high-quality films, the structural, electrical and magnetic properties of MCNO thin films as a function of deposition temperature are investigated. By analyzing the X-ray diffraction patterns and the atomic force microscopy images, it is discovered that the crystallization of MCNO films is highly dependent on the deposition temperature. With the increasing deposition temperature, the resistivity of MCNO thin films is a change of V-type, and the electrical conduction of the MCNO films is controlled by a small polaron hopping mechanism. Meanwhile, the temperature-dependent magnetization curve reveals that all the samples show ferromagnetism to paramagnetism transition and the MCNO film deposited at 600℃ has a high Curie temperature of 216 K. All the results above demonstrate that MCNO film deposited at 600℃ has satisfactory performance, which is desirable for applications of thermistor devices and multifunctional heterojunctions.
keywords:thin film technology  pulsed laser deposition  deposition temperature  magnetic properties
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