摘要
我们报道了一种基于SnS2 / InSe垂直异质结的宽带光电探测器,其光谱范围为365-965 nm。其中,InSe作为光吸收层,有效扩展了光谱范围,SnS2作为传输层,与InSe形成异质结,促进了电子-空穴对的分离,增强了光响应。该光电探测器在 365 nm 下具有813 A/W 的响应度。并且,在965nm光照下它仍然具有371 A/W的高响应度,1.3×1
Photodetectors play an important role in many fields such as remote sensing, reconnaissance, thermal imaging, and medical imaging. Narrow-spectrum photodetectors are unable to meet the increasingly complex needs of photodetection. The two-dimensional (2D) materials have received a lot of attention because of their unique structural, electrical and optical properties since the successful exfoliation of graphene in 200
In this work, a SnS2/InSe vertical structure photodetector was prepared, in which InSe was used as the photo absorption layer and SnS2 was used as the transmission layer. By building a Van der Waals (vdW) heterojunction to form an effective type-II energy band alignment structure, the electron-hole pairs can be separated effectively to extend the carrier lifetime and improve the responsivity. The device had excellent responsivity in the 365-965 nm range, whose responsivity reached 813 A/W under 365 nm illumination with gate voltage modulation. Under the same gate voltage, a maximum responsivity of 371 A/W under 965 nm illumination, which was much higher than other reported broadband photodetector
The SnS2/InSe heterojunction device was fabricated on SiO2/ Si substrates using a dry transfer technique. Firstly, few-layer flakes of SnS2 and InSe were mechanically exfoliated from commercial bulk crystals, and the exfoliated SnS2 flakes were transferred onto a highly p-doped Si substrate with 300 nm SiO2, subsequently. The same approach was then adopted to transfer the exfoliated InSe onto SnS2 with the assistance of an optical microscope (OM, BX51, OLMPUS). Finally, electrode patterns were prepared by electron-beam lithography system (EBL, Raith eLINE Plus) and then Ti/Au (10 nm/50 nm) metal stacks were deposited by electron beam evaporation (Ulvac Ei-5z) to form source and drain electrodes. Then Raman spectrometer (LABRAM HR, Japan Horriba-JY) and atomic force microscopy (AFM, Dimension ICON, American Bruker) were used to measure characteristic peaks and heights of materials. The atomic structure features, the composition and element distribution of the heterojunction were analyzed by high-resolution transmission electron microscopy (HRTEM, Talos) and energy dispersive X-ray spectroscopy (EDS), respectively.

图1 (a) SnS2/InSe异质结构示意图,(b)单一SnS2、单一InSe以及重叠区域的拉曼光谱图,(c)AFM测量的SnS2和InSe薄片的高度图,插图为SnS2/InSe器件的表面形貌,(d) SnS2/InSe器件的SEM图像,(e) HRTEM图像,比例尺为1微米,(f)各层元素的EDS图像
Fig. 1 (a) Schematic diagram of SnS2/InSe heterostructure. (b) Raman spectrum of the single SnS2, single InSe and their overlapped regions. (c) Height measurement maps of SnS2 and InSe flakes in AFM, with insets showing the topographic views of SnS2/InSe devices. (d) The SEM image of the SnS2/InSe device. (e) HRTEM image, scale bar: 1 μm. (f) EDS image of each layer element.
Photoelectric characteristics of the SnS2/InSe heterojunction photodetector was tested.



图2 (a)器件测试示意图,(b)黑暗条件下不同栅极电压的Ids-Vds输出特性曲线(插图是SnS2的输出特性曲线),(c)黑暗条件下不同源漏电压的Ids-Vg转移特性曲线,(d)源漏电压(Vds)为5V时Ids-Vg的对数曲线,(e)在365nm光照下不同入射光功率密度的输出特性曲线(Vg=0 V),(f) 在365nm光照下不同入射光功率密度的转移特性曲线(Vds=5 V)
Fig. 2 (a) Schematic diagram of the device measure setup. (b) Ids-Vds output characteristic curves for different gate voltages under dark conditions (The inset was the output characteristic curves of SnS2). (c) Ids-Vg transfer characteristic curves for different source-drain voltage under dark conditions. (d) The logarithmic curves of Ids-Vg when the source-drain voltage (Vds) is 5 V. (e) Output characteristic curves for different incident optical power densities under 365 nm illumination (Vg=0 V). (f) Transfer characteristic curves for different incident optical power densities under 365 nm illumination (Vds=5 V).
To characterize the detection performance of the SnS2/InSe heterojunction photodetector under 365 nm illumination, the responsivity (R), specific detectivity (D*), external quantum efficiency (EQE), and noise equivalent power (NEP) were calculated according to the following equations:
, | (1) |
, | (2) |
, | (3) |
, | (4) |
where Pin, A, e, h, c, and λ are the incident optical power density, effective illuminated area, electron charge, Planck's constant, light speed, and incident light wavelength, respectively.

图3 365nm光照下的SnS2/InSe异质结光电探测器(a) 不同入射光功率密度下的Iph与栅极电压的函数关系(Vds=5 V),(b)不同入射光功率密度的响应度与栅极电压的函数关系,(c)探测率和噪声等效功率与入射光功率密度的函数关系,(d)外量子效率与入射光功率密度的函数关系
Fig. 3 SnS2/InSe heterojunction photodetector under 365 nm illumination. (a) Iph as a function of incident optical power density and gate voltage (Vds=5 V). (b) Responsivity as a function of gate voltage for different incident optical power densities. (c) Detectivity and noise equivalent power as functions of incident optical power density. (d) External quantum efficiency as a function of incident optical power density.
The response time is an important parameter for evaluating the performance of the photodetector.

图4 (a)365nm光照下的光开关特性曲线,(b)365nm光照下光电流的上升和下降时间
Fig. 4 (a) Optical switching characteristic curve under 365nm illumination. (b) Rise and fall time of photocurrent under 365nm illumination.
In addition, the device had a high optical responsivity and sensitivity from UV to NIR.


图5 (a)不同入射光波长照射下的光开关特性,(b)响应度与栅极电压和入射光波长的2D函数图像,(c)探测率和噪声等效功率与入射光波长的函数关系,(d)外量子效率与入射光波长的函数关系
Fig. 5 (a) Optical switching characteristics under different incident light wavelength irradiation. (b) 2D images of responsivity as a function of gate voltage and incident light wavelength. (c) Detectivity and noise equivalent power as a function of incident light wavelength. (d) External quantum efficiency as a function of incident light wavelength.
To compare with other broadband heterojunction photodetectors,

In summary, we have successfully prepared a SnS2/InSe photodetector. Using the wide band gap of InSe, the photodetector could detect the spectral range from UV to NIR. The device achieved a high responsivity of 813 A/W and 371 A/W under 365 nm and 965 nm illumination, respectively,which was higher than some other reported 2D broadband photodetectors. And the detectivity were the order of 1
致谢
This work is supported by the National Natural Science Foundation of China (No.61574011, 60908012, 61575008, 61775007, 61731019, 61874145, 62074011, 62134008), the Beijing Natural Science Foundation (No.4182015, 4172011, 4202010) and Beijing Nova Program (Z201100006820096) and International Student related expenses-Department of Information(040000513303). The authors would like to thank the Nano Fabrication Facility, Vacuum Interconnected Nanotech Workstation at Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, and Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences for their technical supports.
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