基于黑磷油墨薄膜的中波红外探测器阵列
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1上海大学 微电子学院,上海 201800;2中国科学院上海技术物理研究所 红外科学与技术全国重点实验室,上海 200083;3南通大学 微电子学院(集成电路学院),江苏 南通 226019

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Mid-wavelength infrared detector array based on black phosphorus ink thin film
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1School of Microelectronics, Shanghai University, Shanghai 201800, China;2State Key Laboratory of Infrared Science and Technology, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China;3School of Microelectronics and School of Integrated Circuits, Nantong University, Nantong 226019, China

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Supported by the National Key Research and Development Program of China (Grant Nos. 2023YFB3611400 and 2025YFF0524500 ), National Natural Science Foundation of China (Grant Nos. 62475275, 62174063, 62174061, U24A20295, 62404230), China Postdoctoral Science Foundation (Grant Nos. 2023TQ0362, GZB20230795, 2024M753366), Basic and Applied Basic Research Foundation of Guangdong Province (Grant No. 2023B1515120049), and the National Science Centre (NCN) and the National Natural Science Foundation of China (NSFC)

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    摘要:

    中波红外成像技术在航空航天、医疗诊断和自动驾驶等领域发挥着至关重要的作用。范德华材料黑磷凭借其极高的载流子迁移率和理想的直接带隙,已被证实是构建高性能室温中波红外传感器的有力候选材料。然而,严苛的生长条件及各向异性的生长特性,限制了黑磷光电器件的发展,目前仍停留在小规模实验室演示阶段。因此,开发大规模、均匀且高性能的黑磷光电探测器阵列迫在眉睫。本研究采用一种室温制备技术,将大面积、均匀、低氧化的黑磷墨水薄膜沉积到薄膜晶体管上,成功研制出64 × 64的高性能中波红外快照式光电探测器阵列。该室温墨水制备工艺有效防止了黑磷在加工过程中的氧化,实现了低至1.12%的损耗率。此外,通过梯度离心策略优化了黑磷墨水薄膜的粒径与厚度浓度,从而促进了电荷载流子的传输。该黑磷墨水薄膜阵列在中波红外波段展现出4.52 mA/W的高光响应度,像素光响应非均匀性低至10.1%。本研究为推进大规模中波红外成像技术的发展提供了一条新路径。

    Abstract:

    Mid-wavelength infrared (MWIR) imaging technology plays a crucial role in aerospace, medical diagnostics, and autonomous driving. Van der Waals material black phosphorus (BP) exhibits exceptionally high carrier mobility and an ideal direct bandgap, making it a proven candidate for high-performance room-temperature MWIR sensing. However, the stringent growth conditions and anisotropic growth characteristics restrict the development of BP optoelectronic devices to small-scale laboratory demonstrations. Therefore, there is an urgent need to develop large-scale, uniform, and high-performance BP photodetector arrays. This study employed a room temperature preparation technique to deposit a large-area, uniform, low-oxidation BP ink film onto thin-film transistors, resulting in the development of a 64 × 64 high-performance MWIR snapshot photodetector array. The room temperature ink preparation process effectively prevents the oxidation of BP during fabrication, achieving a loss ratio as low as 1.12%. Additionally, a gradient centrifugation strategy enhanced the particle size and thickness concentration of the BP ink film, thereby facilitating the transport of charge carriers. The BP ink film array demonstrated a high photoresponsivity of 4.52 mA/W in the MWIR range, with pixel light response non-uniformity as low as 10.1%. This study presents a new approach for advancing large-scale MWIR imaging technology.

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  • 收稿日期:2026-02-02
  • 最后修改日期:2026-02-24
  • 录用日期:2026-03-02
  • 在线发布日期: 2026-03-02
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