分子束外延的CdTe在碲镉汞中波器件中钝化效果
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中国科学院上海技术物理研究所,上海 200083

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TN 304.2;TN314+.2

基金项目:

上海市青年科技英才扬帆计划(18YF1427400)


The passivation effects of CdTe deposited by MBE in MW HgCdTe photodiodes
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Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China

Fund Project:

Supported by the Shanghai Youth Science and technology talents sailing plan (18YF1427400)

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    摘要:

    采用分子束外延技术(MBE)制备了碲化镉(CdTe)原位钝化的中波碲镉汞(HgCdTe)材料。原子力显微镜(AFM)和扫描电子显微镜(SEM)测试结果表明,分子束原位外延的CdTe可见cross-hatch,表面粗糙度为1~2 nm,CdTe和HgCdTe界面结合紧密。微波光导测试结果显示,77 K时,与表面处理后非原位CdTe钝化的HgCdTe材料相比,CdTe原位钝化的HgCdTe材料的少子寿命较大。制备了分子束外延CdTe原位钝化的中波HgCdTe光伏器件,和相同材料上的非原位CdTe/ZnS双层钝化制备的器件I-V特性相似。

    Abstract:

    The characterizations of CdTe film deposited by molecular beam epitaxy (MBE) in-suit had been studied using atomic force microscopy (AFM) and scanning electron microscopy (SEM).The cross-hatch pattern can be seen on the CdTe film surface. The roughness of CdTe film deposited by MBE in-suit on HgCdTe is about 1~2 nm. The minority carrier lifetime of HgCdTe passivated by CdTe in-suit is larger than the HgCdTe passivated by the CdTe deposited by E-beam evaporation after etched top 1um HgCdTe at 77 K. The I-V characteristics of MW photodiodes passivated by the CdTe in-suit are similar with the photodiodes passivated by the CdTe/ZnS films.

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解晓辉,林春,陈路,赵玉,张竞,何力.分子束外延的CdTe在碲镉汞中波器件中钝化效果[J].红外与毫米波学报,2022,41(2):413~419]. XIE Xiao-Hui, LIN Chun, CHEN Lu, ZHAO Yu, ZHANG Jing, HE Li. The passivation effects of CdTe deposited by MBE in MW HgCdTe photodiodes[J]. J. Infrared Millim. Waves,2022,41(2):413~419.]

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  • 收稿日期:2021-05-27
  • 最后修改日期:2022-02-08
  • 录用日期:2021-12-22
  • 在线发布日期: 2022-03-31
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