采用Ga(In,As)P异变缓冲层的GaP/Si衬底上InAs量子阱
作者:
作者单位:

1.中国科学院上海微系统与信息技术研究所 太赫兹技术重点实验室,上海 200050;2.中国科学院上海技术物理研究所 传感技术联合国家重点实验室,上海 200083;3.中国科学院上海技术物理研究所 红外成像材料与器件重点实验室,上海 200083;4.中国科学院大学,北京 100049;5.查尔姆斯理工大学 微技术与纳米科学系,哥德堡 SE-41296

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TN215

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InAs quantum wells grown on GaP/Si substrate with Ga(In,As)P metamorphic buffers
Author:
Affiliation:

1.Key Laboratory of Terahertz Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;2.State Key Laboratory of Transducer Technology, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China;3.Key Laboratory of Infrared Imaging Materials and Detectors, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China;4.University of Chinese Academy of Science, Beijing 100049, China;5.Department of Microtechnology and Nanoscience, Chalmers University of Technology, Gothenburg SE-41296, Sweden

Fund Project:

Supported by the National Natural Science Foundation of China (Nos. 62075229 and 61775228), and the International Science and Technology Cooperation Program of Shanghai (No.20520711200)

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    摘要:

    本工作在GaP/Si衬底上基于In0.83Al0.17As异变缓冲层实现了InAs/In0.83Al0.17As量子阱的生长。研究了GaxIn1-xP和GaAsyP1-y递变缓冲层对量子阱结构材料性能的影响。采用GaxIn1-xP组分渐变缓冲层的样品X射线衍射倒易空间衍射峰展宽更小,表明样品中的失配位错更少。两个样品均在室温下实现了中红外波段的光致发光,而采用GaxIn1-xP组分渐变缓冲层的样品在不同温度下都具有更高的光致发光强度。这些结果表明在GaP/Si复合衬底上采用阳离子混合的渐变缓冲层对生长中红外InAs 量子阱结构具有相对更优的效果。

    Abstract:

    InAs/In0.83Al0.17As quantum wells have been demonstrated on In0.83Al0.17As metamorphic layers on GaP/Si substrates. The effects of GaxIn1-xP and GaAsyP1-y graded buffer layers on the sample performances are investigated. The sample with GaxIn1-xP metamorphic buffer layer has narrower width in X-ray diffraction reciprocal space maps, indicating less misfit dislocations in the sample. Mid-infrared photoluminescence signals have been observed for both samples at room temperature, while the sample with GaxIn1-xP metamorphic buffer shows stronger photoluminescence intensity at all temperatures. The results indicate the metamorphic buffers with mixed cations show superior effects for the mid-infrared InAs quantum wells on GaP/Si composite substrates.

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黄卫国,顾溢,金宇航,刘博文,龚谦,黄华,王庶民,马英杰,张永刚.采用Ga(In, As)P异变缓冲层的GaP/Si衬底上InAs量子阱[J].红外与毫米波学报,2022,41(1):253~261]. HUANG Wei-Guo, GU Yi, JIN Yu-Hang, LIU Bo-Wen, GONG Qian, HUANG Hua, WANG Shu-Min, MA Ying-Jie, ZHANG Yong-Gang. InAs quantum wells grown on GaP/Si substrate with Ga(In, As)P metamorphic buffers[J]. J. Infrared Millim. Waves,2022,41(1):253~261.]

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  • 收稿日期:2021-01-20
  • 最后修改日期:2022-01-13
  • 录用日期:2021-03-02
  • 在线发布日期: 2022-01-10
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