中国科学院上海技术物理研究所 红外成像材料与器件重点实验室,上海200083
O484.1
Key Laboratory of infrared imaging materials and detectors, Shanghai Institute of Technical Physics, Chinese Academy of Sciences,Shanghai 200083, China
Supported by National Natural Science Foundation of China(62004206),
魏彦锋,孙权志.液相外延生长过程中外延层厚度的卷积计算方法[J].红外与毫米波学报,2021,40(2):161~165]. WEI Yan-Feng, SUN Quan-Zhi. A convolution approach for the epilayer thickness in liquid phase epitaxial growth[J]. J. Infrared Millim. Waves,2021,40(2):161~165.]
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