In order to improve frequency characteristics, AlGaN/GaN HEMTs were designed by reducing sourcedrain spacing, optimizing gatestructure and peripheral structure. The devices have been fabricated with domestic GaN epitaxial wafer and process. Measurements indicated that the AlGaN/GaN HEMTs can operate at Kaband. At VDS=30V, the HEMTs with 275μm gatewidth exhibited a current gain cutoff frequency (fT) of 32GHz and a maximum frequency of oscillation (fmax) of 150GHz; Under CW operating condition at 30GHz, the linear gain reaches 10.2dB. For the HEMTs with 675μm gatewidth, fT is 32GHz and fmax is 92GHz; Under CW operating condition at 30GHz, the linear gain reaches 8.5dB. The breakdown voltage is over 60V.
参考文献
相似文献
引证文献
引用本文
王东方,袁婷婷,魏珂,刘新宇,刘果果. Ka波段AlGaN/GaN HEMT的研制[J].红外与毫米波学报,2011,30(3):255~259]. WANG Dong-Fang, YUAN Ting-Ting, WEI Ke, LIU Xin-Yu, LIU Guo-Guo. Design and implementation of Kaband AlGaN/GaN HEMTs[J]. J. Infrared Millim. Waves,2011,30(3):255~259.]