| 磁控溅射沉积ZnS薄膜及其性能研究 |
| 投稿时间：2023-11-21 修订日期：2023-11-29 点此下载全文 |
| 引用本文：戴永喜,郑天亮,王娇,赵凯,李乾.磁控溅射沉积ZnS薄膜及其性能研究[J].红外,2024,45(12):40~44 |
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| 中文摘要:采用磁控溅射技术在硅衬底上制备ZnS薄膜，探究了溅射功率对ZnS薄膜沉积速率、表面粗糙度和表面形貌的影响。采用台阶仪、原子力显微镜(Atomic Force Microscope, AFM)、扫描电子显微镜(Scanning Electron Microscope, SEM)、椭偏仪等表征薄膜的表面形貌、微观结构和光学性能。结果表明，ZnS薄膜的沉积速率与溅射功率有关，随溅射功率的增加而线性增加；表面粗糙度与溅射功率相关，随溅射功率的增大呈现先增大后减小的趋势。在微观结构方面，薄膜晶粒尺寸也呈现先变大后减小的趋势。随着溅射功率的增大，ZnS膜层的折射率先减小后增大。因此，溅射功率对膜层生长具有重要的作用。 |
| 中文关键词:磁控溅射 ZnS薄膜 沉积速率 溅射功率 微观结构 |
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| Study on ZnS Thin Films Deposited by Magnetron Sputtering and Their Properties |
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| Abstract:ZnS thin films were prepared on silicon substrates by magnetron sputtering technology, and the effect of sputtering power on the deposition rate, surface roughness and surface morphology of ZnS thin films was investigated. The surface morphology, microstructure and optical properties of the films were characterized by step profiler, atomic force microscope (AFM), scanning electron microscope (SEM), ellipsometer, etc. The results show that the deposition rate of ZnS thin films is related to the sputtering power, and increases linearly with the increase of sputtering power; the surface roughness of ZnS thin films is related to the sputtering power and shows a trend of increasing first and then decreasing with the increase of sputtering power. In terms of microstructure, the grain size of the film also shows a trend of increasing first and then decreasing. With the increase of sputtering power, the refractive index of the ZnS film layer first decreases and then increases. Therefore, the sputtering power plays an important role in the growth of the film layer. |
| keywords:magnetron sputtering ZnS thin film deposition rate sputtering power microstructure |
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