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钝化膜应力对锑化铟器件性能的影响
投稿时间:2022-05-25  修订日期:2022-06-16  点此下载全文
引用本文:米南阳,宁提,李忠贺,崔建维.钝化膜应力对锑化铟器件性能的影响[J].红外,2022,43(12):26~29
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作者单位E-mail
米南阳 华北光电技术研究所 nanyangmi@163.com 
宁提 华北光电技术研究所  
李忠贺 华北光电技术研究所  
崔建维 华北光电技术研究所  
中文摘要:随着InSb红外探测器关键尺寸的不断缩小,钝化膜应力的大小对器件I-V性能的影响越发明显。为了降低探测器芯片的应力,研究了一种由SiO2 和SiON组成的复合钝化膜体系。通过改变气体的射频时间,在InSb晶片上淀积厚度分别为300 nm、500 nm、700 nm和900 nm的钝化膜,测量并计算了不同厚度钝化膜的应力。当厚度为700 nm时,钝化膜的应力最小值为-1.78 MPa。研究了具有不同应力钝化膜的器件的I-V特性,发现厚度为700 nm时InSb芯片具有更加优异的I-V特性。通过调整复合钝化膜的厚度,降低了钝化膜的应力,有效地提升了InSb探测器的性能。
中文关键词:复合钝化膜  应力  InSb红外探测器  伏安特性
 
Effect of Passivation Film Stress on the Performance of InSb Devices
Abstract:With the decreasing of the key size of InSb infrared detector, the influence of the passivation film stress on the I-V performance of the device becomes more and more obvious. In order to reduce the stress of the detector chip, a composite passivation film system consisting of SiO2 and SiON was studied. Passivation films with thicknesses of 300 nm, 500 nm, 700 nm and 900 nm were deposited on InSb wafers by varying the radio frequency (RF) time of the gas. The stresses of passivation films with different thicknesses were measured and calculated. When the thickness is 700 nm, the minimum stress of the passivation film is -1.78 MPa. The I-V characteristics of devices with different stress passivation films are investigated. It is found that the InSb chip has better I-V characteristics when the thickness is 700 nm. By adjusting the thickness of composite passivation film, the stress of passivation film is reduced, and the performance of InSb detector is effectively improved.
keywords:composite passivation film  stress  InSb infrared detector  voltage-current characteristic
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