Sasiain J, Franco D, Atutxa A, et al. Toward the integration and convergence between 5G and TSN technologies and architectures for industrial communications: A survey [J]. IEEE Communications Surveys and Tutorials, 2025, 27(1): 259-321. doi:http://dx.doi.org/10.1109/comst.2024.3422613
Saxena V, Kumar A, Mishra S, et al. Optical interconnects using hybrid integration of CMOS and silicon-photonic ICs [J]. IEEE Transactions on Circuits and Systems II: Express Briefs, 2024, 71(3): 1632-1637. doi:http://dx.doi.org/10.1109/tcsii.2023.3333864
Muttlak S G, Kostakis I, Abdulwahid O S, et al. Low-cost InP–InGaAs PIN–HBT-based OEIC for up to 20 Gb/s optical communication systems [J]. IET Optoelectronics, 2019, 13(3): 144-150. doi:http://dx.doi.org/10.1049/iet-opt.2018.5032
Sharafi F, Orouji A A and Soroosh M. A novel field effect photodiode to control the output photocurrent and fast optical switching [J]. Optical and Quantum Electronics, 2022, 54(3): 171. doi:http://dx.doi.org/10.1007/s11082-022-03573-3
Jiang Z B, Yu Y, Wang Y L, et al. High-power Si-Ge photodiode assisted by doping regulation [J]. 2021, Optics Express, 29(5): 7389-7397. doi:http://dx.doi.org/10.1364/oe.417165
Xie H Y, Shen X T, Ge Y P, et al. A SiGe/Si heterojunction phototransistor for high sensitivity light detection [J]. IEEE Transactions on Electron Devices, 2024, 71(11): 6857-6863. doi:http://dx.doi.org/10.1109/ted.2024.3467218
Nanni J, Tegegne Z G, Viana C, et al. SiGe photo-transistor forlow-cost SSMF based radio-over-fiber applications at 850nm [J]. IEEE Journal of Quantum Electronics, 2019, 55(4): 1-9. doi:http://dx.doi.org/10.1109/jqe.2019.2917209
Xie H Y, Xiang Y, Sha Y, et al. A SiGe/Si phototransistor with high FOM of Gain*VA using 0.35-μm BiCMOS technology [J]. IEEE Transactions on Electron Devices, 2022, 69(10): 5612-5617. doi:http://dx.doi.org/10.1109/ted.2022.3200925
Xie H Y, Ge Y P, Xu Z M, et al. High responsivity and wide bandwidth SiGe/Si phototransistor for optical interconnection [J]. IEEE Transactions on Electron Devices, 2025, 72(5): 2417-2423. doi:http://dx.doi.org/10.1109/ted.2025.3552363
Aladim A K, Aouassa M, Amdouni S, et al. Photocurrent and electrical properties of SiGe nanocrystals grown on insulator via solid-state dewetting of Ge/SOI for Photodetection and solar cells applications [J]. Vacuum, 2025, 232: 113892. doi:http://dx.doi.org/10.1016/j.vacuum.2024.113892
Tegegne Z G, Viana C, Rosales M D, et al. An 850 nm SiGe/Si HPT with a 4.12 GHz maximum optical transition frequency and 0.805A/W responsivity [J]. International Journal of Microwave and Wireless Technologies, 2017, 9(1): 17-24. doi:http://dx.doi.org/10.1017/s1759078715001531
Tegegne Z G, Nanni J, Viana C, et al. Substrate resistivity influence on silicon-germanium phototransistor performance [J]. Electronics Letters, 2019, 55(11): 656-658. doi:http://dx.doi.org/10.1049/el.2019.0203
Kostov P, Gaberl W and Zimmermann H. High-speed bipolar phototransistors in a 180nm CMOS process [J]. Optics and Laser Technology, 2013, 46: 6-13. doi:http://dx.doi.org/10.1016/j.optlastec.2012.04.011
Pogossian S P, A new approach to determining the waveguide mode index distribution [J]. Optical and Quantum Electronics, 1993, 25: 417-422. doi:http://dx.doi.org/10.1007/bf00420583
Pogossian S P, Vescan L and Vonsovici A. The single-mode condition for semiconductor rib waveguides with large cross section [J]. Journal of Lightwave Technology, 1998, 16(10): 1851-1853. doi:http://dx.doi.org/10.1109/50.721072
Lousteau J, Furniss D, Seddon A B, et al. The single-mode condition for silicon-on-insulator optical rib waveguides with large cross section[J]. Journal of Lightwave Technology, 2004, 22(8): 1923-1929. doi:http://dx.doi.org/10.1109/jlt.2004.832427
Tegegne Z G, Viana C, Polleux J L, et al. Improving the opto-microwave performance of SiGe/Si phototransistor through edge-illuminated structure[C]. Silicon Photonics XI, SPIE , 2016, 9752: 220-229. doi:http://dx.doi.org/10.1117/12.2208676
Thary V, Algani C, Chevalier P, and Polleux J.L. Low-cost and low-voltage Si/SiGe phototransistor with high responsivity at 900nm for microwave photonics applications [J]. IEEE Electron Device Letters, 2025, 46(2): 239-242. doi:http://dx.doi.org/10.1109/led.2024.3521117
Li, Andre N G L, Huet B, Delhaye T, al et, Enhanced ultraviolet photoresponse in a graphene-gated ultra-thin Si-based photodiode [J], Journal of Physics D: Applied Physics, 2019, 52(24): 1-7. doi:http://dx.doi.org/10.1088/1361-6463/ab12b8
Cuyvers S, Hermans A, Kiewiet M, Goyvaerts J, et al. Heterogeneous integration of Si photodiodes on silicon nitride for near-visible light detection [J], Optics Letters, 2022, 47(4): 937-940. doi:http://dx.doi.org/10.1364/ol.447636
Lin Y D, Yong Z, Luo X S, Azadeh S S, Mikkelsen J C, et al. Monolithically integrated, broadband, high-efficiency silicon nitride-on-silicon waveguide photodetectors in a visible-light integrated photonics platform [J], Nature Communications, 2022, 13(1): 1-7. doi:http://dx.doi.org/10.1038/s41467-022-34100-3
Gundlapalli P, Leong V, Ong J R, Ang T Y L, et al. Visible-light integrated PIN avalanche photodetectors with high responsivity and bandwidth [J], Journal of Lightwave Technology, 2023, 41(8): 2443-2450. doi:http://dx.doi.org/10.1109/jlt.2022.3231638