Research on the characteristics of the absorption coefficient of InAs and GaSb substrates in the low-absorption region based on FTIR spectroscopy technology
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1State Key Laboratory of Materials for Integrated Circuits, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

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the National Natural Science Foundation of China ( U2241227, 62435020, 12333012)

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    Abstract:

    GaSb and InAs demonstrate significant potential photoelectric applications in mid-wave infrared (3-5 μm) and long-wave infrared (8-12 μm) spectral regions. However, their weak optical absorption properties hinder accurate determination of absorption coefficients via conventional transmission spectroscopy due to multi-pass transmission effects. This study introduces a combined reflection-transmission analysis method based on Fourier-transform infrared spectroscopy (FTIR), achieving enhancement in measurement accuracy within the low-absorption regime (α < 10 cm?1). For samples with doping concentrations of ND = 2.46×1016 cm-3 (InAs) and ND = 8.76×1016 cm-3 (GaSb), the analysis reveals that free carrier absorption in the 8-18 μm range is predominantly governed by acoustic phonon scattering and ionized impurity scattering. Notably, GaSb exhibits significantly enhanced scattering intensity compared to InAs, with a 10-fold increase in ionized impurity scattering coefficient and a 450-fold amplification in acoustic phonon scattering coefficient. The developed methodology provides a technical framework for determining absorption coefficients in low-absorption materials.

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History
  • Received:April 16,2025
  • Revised:July 06,2026
  • Adopted:June 25,2025
  • Online: June 30,2026
  • Published:
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