基于可控衬底偏角调节SESAM缺陷:恢复动力学与光学性能优化
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作者单位:

1中国科学院半导体研究所 光电子器件国家工程研究中心,北京 100083;2中国科学院大学 材料科学与光电工程学院,北京 100049;3中国科学院大学 材料科学与光电技术学院,北京 100049;4深圳市杰普特光电股份有限公司,广东 深圳 518110;5湖南警察学院,湖南 长沙 410138;6北京大学 信息科学技术学院,北京 100871

作者简介:

E-mail: xiongcong@semi.ac.cnlinnan@semi.ac.cn

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中图分类号:

TN248.4

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Defect-Engineered SESAMs via controlled substrate miscut angles: recovery dynamics and optical performance optimization
Author:
Affiliation:

1National Engineering Research Center for Optoelectronic Devices, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;2College of Materials Science and Optoelectronic Engineering, University of Chinese Academy of Sciences, Beijing 100049, China;3College of Materials Science and Optoelectronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China;4Shenzhen JPT Optoelectronics Co., LTD, Shenzhen 518110, China;5Hunan Police Academy, Changsha 410138, China;6College of Information Science and Technology, Peking University, Beijing 100871, China

Fund Project:

Supported by the National Key Research and Development Program of China (2022YFB3606200)

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    摘要:

    半导体可饱和吸收镜(SESAM)是超快光纤激光器实现锁模的核心器件,其锁模特性主要受恢复时间与非线性吸收参数的影响。目前,针对SESAM锁模特性的优化研究,主要集中在量子阱吸收层的结构和材料等参数上,而对其外延生长中衬底偏角这一关键制备参数的定向影响尚缺乏系统研究。本研究首次系统研究了衬底偏角([110]方向偏转0°、2°与6°)对外延生长的InGaAs/GaAsP SESAM结构性能及其锁模特性的影响,揭示了不同衬底偏角对SESAM性能的调控规律。通过高分辨率X射线衍射(HRXRD)、原子力显微镜(AFM)、光致发光谱(PL)及分光光度计等表征手段综合分析发现,增大衬底偏角会引入晶格缺陷,从而显著缩短SESAM的恢复时间;然而,偏角增大也导致表面粗糙度及非饱和损耗增加,进而削弱其非线性吸收性能。在掺镱光纤激光器锁模实验中,采用2°偏角衬底的SESAM成功实现了稳定锁模,输出了中心波长为1 064 nm、脉冲宽度为8.2 ps的脉冲激光;而6°偏角样品因材料质量下降导致锁模性能恶化。该研究填补了衬底偏角影响SESAM锁模特性研究的空白,为高性能超快激光器设计提供了新的优化维度与理论依据。

    Abstract:

    Semiconductor saturable absorber mirrors (SESAMs) are vital for enabling ultrafast fiber lasers, yet their mode-locking performance is often constrained by recovery time and nonlinear absorption parameters. Current optimization studies on SESAM mode-locking properties mainly focus on structural and material parameters of the quantum well absorption layer, while systematic research on the directional influence of a key fabrication parameter—the substrate miscut angle during epitaxial growth—remains scarce. This study presents the first systematic investigation into the impact of substrate miscut angles (0°, 2°, and 6° toward the [110] direction) on the structural properties of epitaxially grown InGaAs/GaAsP SESAMs and their mode-locking characteristics, revealing the regulatory effect of different substrate miscut angles on SESAM performance. Comprehensive characterization via high-resolution X-ray diffraction (HRXRD), atomic force microscopy (AFM), photoluminescence (PL) spectroscopy, and spectrophotometry reveals that increasing the miscut angle introduces lattice defects, significantly shortening recovery time. However, larger miscut angles also increase surface roughness and nonsaturable losses, degrading nonlinear absorption. In the mode-locking experiment of a Yb-doped fiber laser, SESAMs with the 2°-miscut angle achieved stable mode-locking, outputting 8.2 ps pulses at 1064 nm, while the 6°-miscut sample exhibited deteriorated mode-locking performance due to material quality degradation. This work fills a critical gap in understanding how the substrate miscut angle influences SESAM mode-locking properties, providing a new optimization dimension and theoretical foundation for designing high-performance ultrafast lasers.

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黄婷,熊聪,林楠,刘素平,黄少茹,袁庆贺,王新伟,张志刚.基于可控衬底偏角调节SESAM缺陷:恢复动力学与光学性能优化[J].红外与毫米波学报,2026,45(4):647-655. Huang Ting, Xiong Cong, Lin Nan, Liu Su-Ping, Huang Shao-Ru, Yuan Qing-He, Wang Xin-Wei, Zhang Zhi-Gang. Defect-Engineered SESAMs via controlled substrate miscut angles: recovery dynamics and optical performance optimization[J]. J. Infrared Millim. Waves,2026,45(4):647-655.

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  • 收稿日期:2025-09-02
  • 最后修改日期:2026-06-30
  • 录用日期:2025-10-31
  • 在线发布日期: 2026-06-30
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