Effect of extrinsic resistance on noise performance for deep submicron MOSFET
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School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China

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Supported by the National Key R&D Program of China (2020YFB1807301)

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    Abstract:

    This paper investigates the impact of extrinsic resistance on the noise performance of deep submicron MOSFETs (metal-oxide-semiconductor field-effect-transistor) using the noise correlation matrix method. Analytical closed-form expressions for calculating the four noise parameters are derived based on the small-signal and noise-equivalent circuit models. The results show strong agreement between simulated and experimental data for MOSFETs with a gate length of 40 nm and dimensions of 4×5 μm (number of gate fingers × unit gate width.

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History
  • Received:December 23,2024
  • Revised:November 25,2025
  • Adopted:February 13,2025
  • Online: December 02,2025
  • Published:
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