Long wavelength infrared metalens fabricated by photolithography
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Affiliation:

1.School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China;2.State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China;3.Department of Physics, Shanghai Normal University, Shanghai 200234, China;4.Shanghai Engineering Research Center of Energy-Saving Coatings, Shanghai 200083, China;5.University of Chinese Academy of Sciences, Beijing 100049, China

Clc Number:

O43

Fund Project:

Supported by National Key R&D Program of China (2021YFA0715500), National Natural Science Foundation of China (NSFC) (12227901), Strategic Priority Research Program (B) of the Chinese Academy of Sciences (XDB0580000) and Chinese Academy of Sciences President''s International Fellowship Initiative (2021PT0007).

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    Abstract:

    Metasurfaces in the long wave infrared (LWIR) spectrum hold great potential for applications in thermal imaging, atmospheric remote sensing, and target identification, among others. In this study, we designed and experimentally demonstrated a 4 mm size, all-silicon metasurface metalens with large depth of focus operational across a broadband range from 9 μm to 11.5 μm. The experimental results confirm effective focusing and imaging capabilities of the metalens in LWIR region, thus paving the way for practical LWIR applications of metalens technology.

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LI Yun-Peng, LUO Jia-Cheng, JI Ruo-Nan, XIE Mao-Bin, CUI Wen-Nan, WANG Shao-Wei, LIU Feng, LU Wei. Long wavelength infrared metalens fabricated by photolithography[J]. Journal of Infrared and Millimeter Waves,2024,43(5):603~608

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History
  • Received:December 07,2023
  • Revised:August 08,2024
  • Adopted:March 12,2024
  • Online: August 20,2024
  • Published:
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