INFRARED ABSORPTION STUDY OF NITROGEN-OXYGEN COMPLEX IN SILICON
DOI:
CSTR:
Author:
Affiliation:

Clc Number:

O734

Fund Project:

  • Article
  • |
  • Figures
  • |
  • Metrics
  • |
  • Reference
  • |
  • Related
  • |
  • Cited by
  • |
  • Materials
  • |
  • Comments
    Abstract:

    The N-doped and N-undoped single crystal silicon under different conditions was investigated by means of Fourier Transfosm Infrared Spectroscope (FTIR) at room temperature (300K) and low temperature (SK). The experiments pointed out that the 1030cm-1, 1000cm-1 and 806cm-1 optical absorption lines are related to the nitrogenoxygen complex in nitrogen-doped CZ silicon.

    Reference
    Related
    Cited by
Get Citation

Yang Deren, Qne Duanlin. INFRARED ABSORPTION STUDY OF NITROGEN-OXYGEN COMPLEX IN SILICON[J]. Journal of Infrared and Millimeter Waves,1995,14(6):

Copy
Share
Article Metrics
  • Abstract:
  • PDF:
  • HTML:
  • Cited by:
History
  • Received:
  • Revised:
  • Adopted:
  • Online:
  • Published:
Article QR Code