Study on the structural and electrical properties of MgxNi1-xMn2O4 thin films
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School of Material Science and Engineering,University of Shanghai for Science and Technology;National Laboratory for Infrared Physics,Shanghai Institute of Technical Physics,Chinese Academy of Sciences,School of Material Science and Engineering,University of Shanghai for Science and Technology,National Laboratory for Infrared Physics,Shanghai Institute of Technical Physics,Chinese Academy of Sciences,School of Material Science and Engineering,University of Shanghai for Science and Technology;National Laboratory for Infrared Physics,Shanghai Institute of Technical Physics,Chinese Academy of Sciences

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    Abstract:

    The MgxNi1-xMn2O4(MNM x=0, 0.05, 0.10, 0.15, 0.20) films were grown on Al2O3 substrate by chemical solution deposition method. The effect of Mg doping on the structural properties of MNM thin films was studied by x-ray diffraction and field emission scanning electron microscopy. The results show that the films have a single cubic spinel structure and the films aresmooth and uniform, which have good crystallinity. The electrical measurements show that the conduction of MNM thin films was described by a variable range hopping model. The values of resistivity, characteristic temperature T0, negative resistance temperature coefficient α for MNM thin films were obtained. The Mg concentration dependence of structural and electrical properties for MNM films was investigated.

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ZHANG Zeng-Hui, LIU Fang, HOU Yun, DI Wen-Qi. Study on the structural and electrical properties of MgxNi1-xMn2O4 thin films[J]. Journal of Infrared and Millimeter Waves,2017,36(4):415~419

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History
  • Received:January 21,2017
  • Revised:February 16,2017
  • Adopted:February 22,2017
  • Online: August 29,2017
  • Published:
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