Optimization of measurement configuration in optical scatterometry for one-dimensional nanostructures based on sensitivity analysis
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Huazhong University of Science and Technology,Huazhong University of Science and Technology,Huazhong University of Science and Technology,Huazhong University of Science and Technology,Huazhong University of Science and Technology,Huazhong University of Science and Technology

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    Abstract:

    In optical scatterometry, the sensitivity has a significant impact on the precision of the extracted structral parameters in addition to the quality of the measured signatures. As the sensitivity of structral parameters can be improved with the proper selection of measurement configuration (a combination of wavelengths, incidence, and azimuthal angles), we proposed a method to determine an optimal one for optical scatterometry based on sensitivity analysis. Experiments performed on a one-dimensional periodic grating show agreement between the theoretically predicted and experimentally obtained optimal measurement configurations, which demonstrates the validity of the proposed optimization method.

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DONG Zheng-Qiong, LIU Shi-Yuan, CHEN Xiu-Guo, SHI Ya-Ting, ZHANG Chuan-Wei, JIANG Hao. Optimization of measurement configuration in optical scatterometry for one-dimensional nanostructures based on sensitivity analysis[J]. Journal of Infrared and Millimeter Waves,2016,35(1):116~122

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History
  • Received:March 17,2015
  • Revised:July 17,2015
  • Adopted:August 31,2015
  • Online: March 25,2016
  • Published:
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