High-k gate oxides integration of graphene based infrared detector
DOI:
Author:
Affiliation:

State Key Lab of ASIC & System and School of Microelectronics,复旦大学,复旦大学,复旦大学,复旦大学,复旦大学,复旦大学,复旦大学

Clc Number:

Fund Project:

  • Article
  • |
  • Figures
  • |
  • Metrics
  • |
  • Reference
  • |
  • Related
  • |
  • Cited by
  • |
  • Materials
  • |
  • Comments
    Abstract:

    This review gives an introduction to the discovery and fabrication of the graphene, back-gated and top-gated GFET with the possible tunable band-gap of 0~250 meV at room temperature for middle and far infrared detector application, radio frequency GFET application and other advanced high k gate oxides integration processes.

    Reference
    Related
    Cited by
Get Citation

ZHOU Peng, WEI Hong-Qiang, SUN Hai-Tao, YE Li, CHEN Lin, WU Dong-Peng, DING Shi-Jin, ZHANG Wei. High-k gate oxides integration of graphene based infrared detector[J]. Journal of Infrared and Millimeter Waves,2012,31(2):118~121

Copy
Share
Article Metrics
  • Abstract:
  • PDF:
  • HTML:
  • Cited by:
History
  • Received:February 24,2011
  • Revised:June 24,2011
  • Adopted:April 10,2011
  • Online: April 23,2012
  • Published: