(英)厚度与带隙可调、原子层沉积的超薄五氧化二钒纳米晶薄膜
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中国科学院上海技术物理研究所

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Atomic-Layer-Deposited ultrathin films of vanadium pentoxide crystalline nanoflakes with controllable thickness and optical band-gap
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Shanghai Institute of Technical Physics, Chinese Academy of Sciences

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    摘要:

    利用原子层沉积方法制备V2O5纳米片晶薄膜。薄膜厚度可以被精确控制,并对纳米晶V2O5薄膜的结构形貌、光学带隙和拉曼振动有重要影响。原子层沉积过程中V2O5薄膜生长的两个阶段导致薄膜具有两个光学带隙,这将有助于理解超薄薄膜生长与功能应用。

    Abstract:

    Thin films of crystalline V2O5 nanoflakes were prepared through atomic layer deposition (ALD) process. The film thickness was verified to play a critical role in determining structural morphology, optical bandgap and Raman vibration of crystalline V2O5 thin films. Two optical bandgaps observed at about 2.8 eV and 2.4 eV result from two growth stages during ALD preparation. We expect that these results help to understand the growth control of ultrathin films and their functional devices.

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张天宁,王书霞,黄田田,魏 威,陈 鑫,戴 宁.(英)厚度与带隙可调、原子层沉积的超薄五氧化二钒纳米晶薄膜[J].红外与毫米波学报,2019,38(1):3~7]. ZHANG Tian-Ning, WANG Shu-Xia, HUANG Tian-Tian, WEI Wei, CHEN Xin, DAI Ning. Atomic-Layer-Deposited ultrathin films of vanadium pentoxide crystalline nanoflakes with controllable thickness and optical band-gap[J]. J. Infrared Millim. Waves,2019,38(1):3~7.]

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历史
  • 收稿日期:2018-03-18
  • 最后修改日期:2018-04-09
  • 录用日期:2018-04-09
  • 在线发布日期: 2019-03-11
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