Thin films of Mn-Co-Ni-O (MCNO) with different cation distribution are deposited by the magnetron sputtering method. By analyzing the material structure, it can be found that the grain size grows gradually with increasing Co ion number, while the lattice parameter grows first and then decreases when the Mn ion number is constant,. The preferentialSorientation ofSthe thin films changesSfromS(311) planeStoS(400) plane with increasing Mn ion number and the properties of the thin films are unstable when the Co ion number is constant. The electrical properties show that both of the Mn ions and the Co ions participate in the conductivity, and Mn1.2Co1.5Ni0.3O4 has the lowest resistivity (235 Ω.cm) and the highest negative temperature coefficient of resistance (NTCR) |α295| (4.7%.K-1) at room temperature.