(英)沉积参数对射频磁控溅射制备的碲锌镉薄膜的影响
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上海技术物理研究所红外物理国家实验室,上海技术物理研究所红外物理国家实验室,上海太阳能电池研究与发展中心,上海太阳能电池研究与发展中心,上海技术物理研究所红外物理国家实验室

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Effects of deposition parameters on Cd1-xZnxTe films prepared by RF magnetron sputtering
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National Laboratory for infrared physics,Shanghai Institute of Technical Physics,Chinese Academy of Sciences,National Laboratory for infrared physics,Shanghai Institute of Technical Physics,Chinese Academy of Sciences,ShangHai Center for Photovoltaics,ShangHai Center for Photovoltaics,National Laboratory for infrared physics,Shanghai Institute of Technical Physics,Chinese Academy of Sciences

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    摘要:

    采用Cd0.96Zn0.04Te靶, 利用射频磁控溅射制备碲锌镉薄膜, 通过改变基片温度、溅射功率和工作气压, 制得不同的碲锌镉薄膜.将制备的碲锌镉薄膜放置在高纯空气气氛中, 在473 K温度下退火.利用台阶仪、分光光度计、XRD和SEM测试设备表征, 结果表明, 通过退火和改变沉积参数, 可以制备出禁带宽度在1.45 ~2.02 eV之间调节的碲锌镉薄膜.

    Abstract:

    Cd1-xZnx Te films were deposited by RF magnetron sputtering from Cd0.96 Zn0.04Te crystals target at different substrate temperatures, RF powers and working pressures. After deposition, the samples were annealed in high purity air at 473 K. The films were characterized using step profilometer, UV-VIS-NIR spectrophotometer, XRD and SEM. Depending on the deposition parameters and annealing, the values of the band gap of the CZT films varied between 1.45 and 2.02 eV.

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曹鸿,褚君浩,王善力,邬云骅,张传军.(英)沉积参数对射频磁控溅射制备的碲锌镉薄膜的影响[J].红外与毫米波学报,2013,32(2):97~101]. CAO Hong, CHU Jun-Hao, WANG Shan-Li, WU Yun-Hua, ZHANG Chuan-Jun. Effects of deposition parameters on Cd1-xZnxTe films prepared by RF magnetron sputtering[J]. J. Infrared Millim. Waves,2013,32(2):97~101.]

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  • 收稿日期:2012-08-13
  • 最后修改日期:2012-12-10
  • 录用日期:2012-09-04
  • 在线发布日期: 2013-04-23
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