多波长薄膜厚度检测方法研究
作者:
作者单位:

1.上海科技大学 物质科学与技术学院,上海 201210;2.中国科学院上海技术物理研究所 红外物理国家重点实验室,上海 200083;3.上海节能镀膜玻璃工程技术研究中心,上海 200083;4.上海市光学薄膜与光谱调控重点实验室,上海 200083;5.中国科学院上海技术物理研究所,上海 200083

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中图分类号:

O43

基金项目:


Study on multi-wavelength thin film thickness determination method
Author:
Affiliation:

1.School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China;2.State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China;3.Shanghai Engineering Research Center of Energy-Saving Coatings, Shanghai 200083, China;4.Shanghai Key Laboratory of Optical Coatings and Spectral Modulation, Shanghai 200083, China;5.Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China

Fund Project:

Supported by National Key R&D Program of China (2021YFA0715500), National Natural Science Foundation of China (NSFC) (12227901), Strategic Priority Research Program (B) of the Chinese Academy of Sciences (XDB0580000), Shanghai Municipal Science and Technology Major Project(2019SHZDZX01) and Chinese Academy of Sciences President''s International Fellowship Initiative (2021PT0007).

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    摘要:

    本工作提出了一种新的薄膜厚度检测方法,该多波长方法显著地降低了膜厚检测对于宽光谱数据的需要。不同于需要几百个光谱数据点的传统技术,多波长方法在仅采用10个波长数据点的情况下即可实现精确的膜厚测量。这一创新不仅简化了光谱测量分析的过程,同时也使得工业化镀膜产线上实时的膜厚准确检测成为可能。该方法能够在使用少量数据的情况下有效地恢复和拟合可见波段光谱(400~800 nm),同时能够很好地将膜厚检测误差保持在7.1%以内。这一进展为许多工业应用中更加实用而高效的薄膜厚度检测技术奠定了基础。

    Abstract:

    This work introduces a novel method for measuring thin film thickness, employing a multi-wavelength method that significantly reduces the need for broad-spectrum data. Unlike traditional techniques that require several hundred spectral data points, the multi-wavelength method achieves precise thickness measurements with data from only 10 wavelengths. This innovation not only simplifies the process of spectral measurement analysis but also enables accurate real-time thickness measurement on industrial coating production lines. The method effectively reconstructs and fits the visible spectrum (400~800 nm) using a minimal amount of data, while maintaining measurement error within 7.1%. This advancement lays the foundation for more practical and efficient thin film thickness determination techniques in various industrial applications.

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引用本文

施策,谢茂彬,郑伟波,冀若楠,王少伟,陆卫.多波长薄膜厚度检测方法研究[J].红外与毫米波学报,2024,43(6):813~819]. SHI Ce, XIE Mao-Bin, ZHENG Wei-Bo, JI Ruo-Nan, WANG Shao-Wei, LU Wei. Study on multi-wavelength thin film thickness determination method[J]. J. Infrared Millim. Waves,2024,43(6):813~819.]

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  • 收稿日期:2024-02-26
  • 最后修改日期:2024-11-08
  • 录用日期:2024-04-17
  • 在线发布日期: 2024-11-06
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