V/III比对分子束外延生长的GaAs基InAsxSb1-x电子迁移率的影响
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作者单位:

1.陕西科技大学,电子信息与人工智能学院,陕西 西安710016;2.西安交通工程学院,机电工程学院,陕西 西安710300;3.河北科技大学,信息科学与工程学院,河北 石家庄 050018

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TN304.2;TN305

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The influence of V/III ratio on electron mobility of the InAsxSb1-x layers grown on GaAs substrate by molecular beam epitaxy
Author:
Affiliation:

1.School of Electronic Information and Artificial Intelligence, Shaanxi University of Science and Technology, Xi’an 710016, China;2.School of Mechanical and Electrical Engineering, Xi’an Traffic Engineering Institute, Xi’an 710300, China;3.School of Information Science and Engineering, Hebei University of Science and Technology, Shijiazhuang 050018, China

Fund Project:

This work was supported by the Natural Science Basic Research Program of Shaanxi Province (2023-JC-QN-0758), Shaanxi University of Science and Technology Research Launch Project (2020BJ-26). Doctoral Research Initializing Fund of Hebei University of Science and Technology, China (1181476).

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    摘要:

    研究了Sb/In比对200 nm InAsxSb1-x薄膜传输特性和晶体质量的影响。通过对称(004)扫描和非对称(115)扫描的HRXRD计算了所有样品中InAsxSb1-x薄膜的Sb含量。计算结果表明,在Sb/In比为6和As/In比为3的条件下生长的InAsxSb1-x薄膜中,Sb组分为0.6。InAsxSb1-x薄膜在室温下测得的最高电子迁移率为28 560 cm2/V·s。同时,本文还研究了Sb/In比和As/In比对Al0.2In0.8Sb/InAsxSb1-x量子阱异质结的输运性质和晶体质量的影响。结果显示,在Sb/In比为6和As/In比为3的条件下生长的沟道厚度为30 nm的Al0.2In0.8Sb/InAs0.4Sb0.6量子阱异质结的最高电子迁移率为28 300 cm2/V·s,最小表面粗糙度为0.68 nm。通过优化生长条件,我们的样品具有更好的晶体质量和更光滑的表面形貌。

    Abstract:

    This paper discusses the influence of Sb/In ratio on the transport properties and crystal quality of the 200 nm InAsxSb1-x thin film. The Sb content of InAsxSb1-x thin film in all samples was verified by HRXRD of the symmetrical 004 reflections and asymmetrical 115 reflections. The calculation results show that the Sb component was 0.6 in the InAsxSb1-x thin film grown under the conditions of Sb/In ratio of 6 and As/In ratio of 3, which has the highest electron mobility (28 560 cm2/V·s) at 300 K. At the same time, the influence of V/III ratio on the transport properties and crystal quality of Al0.2In0.8Sb/InAsxSb1-x quantum well heterostructures also has been investigated. As a result, the Al0.2In0.8Sb/InAs0.4Sb0.6 quantum well heterostructure with a channel thickness of 30 nm grown under the conditions of Sb/In ratio of 6 and As/In ratio of 3 has a maximum electron mobility of 28 300 cm2/V·s and a minimum RMS roughness of 0.68 nm. Through optimizing the growth conditions, our samples have higher electron mobility and smoother surface morphology.

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张静,阳智,郑黎明,朱小娟,王萍,杨琳. V/III比对分子束外延生长的GaAs基InAsxSb1-x电子迁移率的影响[J].红外与毫米波学报,2025,44(1):25~32]. ZHANG Jing, YANG Zhi, ZHENG Li-Ming, ZHU Xiao-Juan, WANG Ping, YANG Lin. The influence of V/III ratio on electron mobility of the InAsxSb1-x layers grown on GaAs substrate by molecular beam epitaxy[J]. J. Infrared Millim. Waves,2025,44(1):25~32.]

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历史
  • 收稿日期:2024-01-20
  • 最后修改日期:2024-08-02
  • 录用日期:2024-03-12
  • 在线发布日期: 2024-08-02
  • 出版日期: 2025-02-25
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