HgCdTe APD is one of the developing trends of third generation inferred FPA detectors. This article presents a new method to fabricate HgCdTe APD by Ion Beam Etch (IBE), and discusses the relation of gain to cutoff wavelength and depletion region thickness. A gain of 1000 at a bias of 17V was achieved in a HgCdTe APD with a cutoff wavelength of 4.8μm fabricated by this method. The noise factor, F, is calculated after a noise spectrum test.
参考文献
相似文献
引证文献
引用本文
李浩,林春,周松敏,王溪,孙权志.利用刻蚀工艺制备碲镉汞雪崩光电二极管[J].红外与毫米波学报,2019,38(2):223~227]. LI Hao, LIN Chun, ZHOU Song-Min, WANG Xi, SUN Quan-Zhi. HgCdTe APD fabricated by Ion Beam Etch[J]. J. Infrared Millim. Waves,2019,38(2):223~227.]