MgxNi1-xMn2O4薄膜结构与电学特性研究
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上海理工大学 材料科学与工程学院;中国科学院上海技术物理研究所 红外物理国家重点实验室,上海理工大学 材料科学与工程学院,中国科学院上海技术物理研究所 红外物理国家重点实验室,上海理工大学 材料科学与工程学院;中国科学院上海技术物理研究所 红外物理国家重点实验室

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国家自然科学基金(61275111),上海市国家自然基金(15ZR1445700)


Study on the structural and electrical properties of MgxNi1-xMn2O4 thin films
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School of Material Science and Engineering,University of Shanghai for Science and Technology;National Laboratory for Infrared Physics,Shanghai Institute of Technical Physics,Chinese Academy of Sciences,School of Material Science and Engineering,University of Shanghai for Science and Technology,National Laboratory for Infrared Physics,Shanghai Institute of Technical Physics,Chinese Academy of Sciences,School of Material Science and Engineering,University of Shanghai for Science and Technology;National Laboratory for Infrared Physics,Shanghai Institute of Technical Physics,Chinese Academy of Sciences

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    摘要:

    采用化学溶液沉积法在Al2O3衬底上生长了MgxNi1-xMn2O4(MNM, x=0, 0.05, 0.10, 0.15, 0.20)薄膜.通过X射线衍射仪和场发射扫描电子显微镜研究了Mg掺杂浓度对MNM薄膜的结构特性的影响,MNM薄膜均匀致密,具有良好的结晶性,为单一立方尖晶石结构.MNM薄膜的变温电流-电压特性研究显示,MNM薄膜的电输运特性符合小极化子变程跳跃电导模型,同时获得了不同Mg掺杂浓度的MNM薄膜的电阻率、特征温度T0和负电阻温度系数α. 研究结果表明,Mg的掺杂对MNM薄膜的结构和电学特性都有一定的影响.

    Abstract:

    The MgxNi1-xMn2O4(MNM x=0, 0.05, 0.10, 0.15, 0.20) films were grown on Al2O3 substrate by chemical solution deposition method. The effect of Mg doping on the structural properties of MNM thin films was studied by x-ray diffraction and field emission scanning electron microscopy. The results show that the films have a single cubic spinel structure and the films aresmooth and uniform, which have good crystallinity. The electrical measurements show that the conduction of MNM thin films was described by a variable range hopping model. The values of resistivity, characteristic temperature T0, negative resistance temperature coefficient α for MNM thin films were obtained. The Mg concentration dependence of structural and electrical properties for MNM films was investigated.

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张增辉,刘 芳,侯 云,第文琦. MgxNi1-xMn2O4薄膜结构与电学特性研究[J].红外与毫米波学报,2017,36(4):415~419]. ZHANG Zeng-Hui, LIU Fang, HOU Yun, DI Wen-Qi. Study on the structural and electrical properties of MgxNi1-xMn2O4 thin films[J]. J. Infrared Millim. Waves,2017,36(4):415~419.]

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  • 收稿日期:2017-01-21
  • 最后修改日期:2017-02-16
  • 录用日期:2017-02-22
  • 在线发布日期: 2017-08-29
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