A simple and cost effective method to fabricate column shape two dimensional photonic crystals by holographic lithography technique using double development has been reported. In the process two dimensional big-dot-type periodic structures have been generated directly on positive photoresist, and then transferred to the substrate through the Si3N4 hard mask. By using double development, the photoresist exposed to high and medium intensity can be developed away effectively, while those exposed to low intensity can still be preserved. The period of the two dimensional structures can be easily controlled by adjusting the angle of two incident beams. The structures in a large period range over a relative large area have been generated with good uniformity and reproducibility. The processing parameters are discussed in detail.