Si掺杂对缺陷诱导的GaN磁性的影响
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国家自然基金资助


The effect of Si co-doping on defect-induced intrinsic magnetism in GaN
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    摘要:

    利用第一性原理局域密度自旋近似方法,研究了缺陷诱导的GaN的内禀磁性以及Si掺杂对缺陷GaN磁性的影响.研究发现缺陷诱导GaN的内禀磁矩为3μB,Si掺杂后缺陷诱导的GaN磁矩发生淬灭为2μB.随Si含量的增加磁矩进一步减少.该理论结果对实验有指导意义.

    Abstract:

    Using the first principle method within the local spin density approximation, both the magnetism of defect induced in GaN and the effect of Si codoping on the magnetism in GaN with defect were investigated. It was found that defectinduced intrinsic magnetic moment of GaN is 3μB, while the magnetic moment is quenched to 2μB in Sicodoping GaN:Si. The magnetic moment decreases with the increase of the concentration of Si. The result is very helpful for experiments.

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张蕾,邢怀中,黄燕,张会媛,王基庆. Si掺杂对缺陷诱导的GaN磁性的影响[J].红外与毫米波学报,2011,30(3):229~233]. ZHANG Lei, XING Huai-Zhong, HUANG Yan, ZHANG Hui-Yuan, WANG Ji-Qing. The effect of Si co-doping on defect-induced intrinsic magnetism in GaN[J]. J. Infrared Millim. Waves,2011,30(3):229~233.]

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  • 收稿日期:2010-08-30
  • 最后修改日期:2010-11-14
  • 录用日期:2010-11-14
  • 在线发布日期: 2011-06-14
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