Si掺杂对缺陷诱导的GaN磁性的影响
DOI:
作者:
作者单位:

作者简介:

通讯作者:

中图分类号:

基金项目:

国家自然基金资助


The effect of Si co-doping on defect-induced intrinsic magnetism in GaN
Author:
Affiliation:

Fund Project:

  • 摘要
  • |
  • 图/表
  • |
  • 访问统计
  • |
  • 参考文献
  • |
  • 相似文献
  • |
  • 引证文献
  • |
  • 资源附件
  • |
  • 文章评论
    摘要:

    利用第一性原理局域密度自旋近似方法,研究了缺陷诱导的GaN的内禀磁性以及Si掺杂对缺陷GaN磁性的影响.研究发现缺陷诱导GaN的内禀磁矩为3μB,Si掺杂后缺陷诱导的GaN磁矩发生淬灭为2μB.随Si含量的增加磁矩进一步减少.该理论结果对实验有指导意义.

    Abstract:

    Using the first principle method within the local spin density approximation, both the magnetism of defect induced in GaN and the effect of Si codoping on the magnetism in GaN with defect were investigated. It was found that defectinduced intrinsic magnetic moment of GaN is 3μB, while the magnetic moment is quenched to 2μB in Sicodoping GaN:Si. The magnetic moment decreases with the increase of the concentration of Si. The result is very helpful for experiments.

    参考文献
    相似文献
    引证文献
引用本文

张蕾,邢怀中,黄燕,张会媛,王基庆. Si掺杂对缺陷诱导的GaN磁性的影响[J].红外与毫米波学报,2011,30(3):229~233]. ZHANG Lei, XING Huai-Zhong, HUANG Yan, ZHANG Hui-Yuan, WANG Ji-Qing. The effect of Si co-doping on defect-induced intrinsic magnetism in GaN[J]. J. Infrared Millim. Waves,2011,30(3):229~233.]

复制
分享
文章指标
  • 点击次数:
  • 下载次数:
  • HTML阅读次数:
  • 引用次数:
历史
  • 收稿日期:2010-08-30
  • 最后修改日期:2010-11-14
  • 录用日期:2010-11-14
  • 在线发布日期: 2011-06-14
  • 出版日期: