| 磁控溅射沉积ZnS 薄膜及其性能研究 |
| 投稿时间：2023-11-21 修订日期：2023-11-29 点此下载全文 |
| 引用本文： |
| 摘要点击次数: 128 |
| 全文下载次数: 0 |
|
|
| 中文摘要:采用磁控溅射技术在硅衬底上制备ZnS薄膜，探究了溅射功率对ZnS薄膜沉积速率、表面粗糙度和表面形貌的影响。采用台阶仪、原子力显微镜、扫描电子显微镜、椭偏仪等表征了薄膜的表面形貌、微观结构和光学性能。结果表明，薄膜的沉积速率与溅射功率有关，随溅射功率的增加呈线性增加。ZnS薄膜的表面粗糙度的大小与溅射功率相关，随溅射功率的增大呈现出先增大后减小的趋势。微观结构方面薄膜晶粒尺寸也呈现先变大后减小的趋势。膜层的折射率方面，随着溅射功率增大ZnS膜层的折射率呈现先减小后增大。溅射功率对膜层的生长有重要的作用。 |
| 中文关键词:磁控溅射 ZnS薄膜 沉积速率 溅射功率 微观结构 |
| |
| Study on properties of ZnS thin films deposited by magnetron sputtering |
|
|
| Abstract:ZnS films were prepared on silicon substrate by magnetron sputtering technology. The effects of sputtering power on deposition rate, surface roughness and surface morphology of ZnS films were investigated. The surface morphology, microstructure and optical properties of the films were characterized by step meter, atomic force microscope, scanning electron microscope and ellipsometer. The results show that the deposition rate of the films is related to the sputtering power and increases linearly with the increase of the sputtering power. The surface roughness of ZnS films is related to the sputtering power, and increases first and then decreases with the increase of the sputtering power. In terms of microstructure, the grain size of the film also showed a trend of first increasing and then decreasing. With the increase of sputtering power, the refractive index of ZnS film decreases first and then increases. The sputtering power plays an important role in the growth of the film layer. |
| keywords:Magnetron sputtering ZnS film Sedimentation rate Sputtering power microstructure |
| HTML 查看/发表评论 下载PDF阅读器 |